Atomic layer deposition of zirconium oxide thin films
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چکیده
منابع مشابه
Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films
Hafnium and zirconium oxide films were prepared by atomic layer deposition (ALD) from dialkylamido precursors. Water was used as the oxygen source. Nanolaminates of hafnium, zirconium and aluminum oxide were also prepared. Atomic force microscopy was used to characterize the surface morphology of 10–100 nm thick films grown from 501C to 3001C. X-ray diffraction was used to characterize the film...
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Aalto University, P.O. Box 11000, FI-00076 Aalto www.aalto.fi Author Pia Sundberg Name of the doctoral dissertation Atomic/molecular layer deposition of hybrid inorganic-organic thin films Publisher School of Chemical Technology Unit Department of Chemistry Series Aalto University publication series DOCTORAL DISSERTATIONS 201/2014 Field of research Inorganic Chemistry Manuscript submitted 11 Se...
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ژورنال
عنوان ژورنال: Journal of Materials Research
سال: 2019
ISSN: 0884-2914,2044-5326
DOI: 10.1557/jmr.2019.338